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3-D Lithography by CCFL Exposure

[+] Author Affiliations
Zong-Ting Yuan, Cheng-Chang Lee, Horng-Jou Wang, Heng-Chung Chang, Huang-Kun Chen, Tai-Kang Shing

Delta Electronics Corporation, Taoyuan Hsien, Taiwan, R.O.C.

Paper No. IMECE2007-41733, pp. 393-397; 5 pages
doi:10.1115/IMECE2007-41733
From:
  • ASME 2007 International Mechanical Engineering Congress and Exposition
  • Volume 3: Design and Manufacturing
  • Seattle, Washington, USA, November 11–15, 2007
  • Conference Sponsors: ASME
  • ISBN: 0-7918-4297-5 | eISBN: 0-7918-3812-9
  • Copyright © 2007 by ASME

abstract

A novel means for 3-D microfabrication is proposed. First, a process for generating metal patterns on the outer surface of a CCFL (Cold Cathode Fluorescent Lamp) was developed. The CCFL with the integrated mask was then used as an exposure source for subsequent lithography process to achieve the pattern transfer on the inner surface of a Cu tube. After wet etch, various grooves were successfully fabricated onto the inner surface of the Cu tube with a 2.47mm inner diameter. By the proposed method, the minimum achievable line-width could be less than 20μm. Compared with traditional manufacturing methods, the proposed approach could improve the machining precision and roughness, reduce the manufacturing difficulties, and lower the manufacturing cost substantially.

Copyright © 2007 by ASME

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