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Molecular Dynamics Study of Nano-Tribological Properties of Silicon Nitride Films

[+] Author Affiliations
Longqiu Li, Shufeng Wang, Wuyi Wang

Harbin Institute of Technology, Harbin, China

Andrey Ovcharenko

West Digital Corporation, San Jose, CA

Paper No. DETC2014-34857, pp. V004T09A025; 4 pages
doi:10.1115/DETC2014-34857
From:
  • ASME 2014 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference
  • Volume 4: 19th Design for Manufacturing and the Life Cycle Conference; 8th International Conference on Micro- and Nanosystems
  • Buffalo, New York, USA, August 17–20, 2014
  • Conference Sponsors: Design Engineering Division, Computers and Information in Engineering Division
  • ISBN: 978-0-7918-4635-3
  • Copyright © 2014 by ASME

abstract

Silicon nitride films were attracting extensive research interest in the past few decades as hard disk protective coating, especially the beta-silicon nitride (β-Si3N4) films and amorphous silicon nitride (SiNx) films, which have high hardness, chemical durability and low friction coefficient properties against wear, corrosion and reducing the friction resistance, respectively. Considerable efforts have been made in studying silicon nitride. However, it’s difficult to determine its nano-tribological properties experimentally since the results were affected by a lot of contact and environment conditions.

The molecular dynamics (MD) simulation method is employed in this work. A rigid diamond sphere modeled as a spherical tip are sliding over a layered silicon nitride film substrate, respectively, to investigate the tribological properties of silicon nitride films. The effect of the relative sliding velocity and sliding direction, the normal force and the thickness of crystalline silicon nitride films on the friction coefficient of silicon nitride films were investigated.

Copyright © 2014 by ASME

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