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Integrating CAD and Nano-Indentation for Complex Lithography

[+] Author Affiliations
Kangmin Xu, Seung-Cheol Yang, Xiaoping Qian

Illinois Institute of Technology, Chicago, IL

Paper No. DETC2012-71548, pp. 439-447; 9 pages
doi:10.1115/DETC2012-71548
From:
  • ASME 2012 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference
  • Volume 2: 32nd Computers and Information in Engineering Conference, Parts A and B
  • Chicago, Illinois, USA, August 12–15, 2012
  • Conference Sponsors: Design Engineering Division, Computers and Information in Engineering Division
  • ISBN: 978-0-7918-4501-1
  • Copyright © 2012 by ASME

abstract

We present an approach for producing complex nanoscale patterns by integrating computer-aided design (CAD) geometry processing with an atomic force microscope (AFM) based nanoindentation process. Surface modification is achieved by successive nano-indentation using a vibrating tip. By incorporating CAD geometry, this approach provides enhanced design and patterning capability for producing geometric features of both straight lines and freeform B-splines. This method automatically converts a pattern created in CAD software into a lithography plan for successive nanoindentation. For ensuring reliable lithography, key machining parameters including the interval of nanoindentation and the depth of nanogrooves have been investigated, and a proper procedure for determining the parameters has been provided. Finally, the automated nanolithography has been demonstrated on poly methylmethacrylate samples. It shows the robustness of the CAD integrated, AFM based nanoindentation approach in fabricating complex patterns.

Copyright © 2012 by ASME

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