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Study of Nanoimprinting Process and its Application for Infrared Detection

[+] Author Affiliations
Je Kyun Lee, Sangyup Song

Nanotrons Corporation, Woburn, MA

Puminun Vasinajindakaw, Michael McGinley, CheFu Su, Junwei Su, ByungWook Son, Plamen Atanassov, Hongwei Sun

University of Massachusetts Lowell, Lowell, MA

Paper No. HT2012-58367, pp. 947-953; 7 pages
doi:10.1115/HT2012-58367
From:
  • ASME 2012 Heat Transfer Summer Conference collocated with the ASME 2012 Fluids Engineering Division Summer Meeting and the ASME 2012 10th International Conference on Nanochannels, Microchannels, and Minichannels
  • Volume 1: Heat Transfer in Energy Systems; Theory and Fundamental Research; Aerospace Heat Transfer; Gas Turbine Heat Transfer; Transport Phenomena in Materials Processing and Manufacturing; Heat and Mass Transfer in Biotechnology; Environmental Heat Transfer; Visualization of Heat Transfer; Education and Future Directions in Heat Transfer
  • Rio Grande, Puerto Rico, USA, July 8–12, 2012
  • Conference Sponsors: Heat Transfer Division
  • ISBN: 978-0-7918-4477-9
  • Copyright © 2012 by ASME

abstract

Nanoimprint Lithography (NIL) is becoming a powerful tool for nanolithography, nanofabrication and nanomanufacturing for nanotechnology applications. However, there is still a lack of systematic study of key processing parameters, which determine the imprinted pattern quality in terms of uniformity and replication fidelity.

This research focuses on identifying the most important parameters in a nanoimprint process, in which microscale patterns were imprinted into polymethyl-methacrylate (PMMA) polymer with polydimethylsiloxane (PDMS) mold. The effects of several parameters such as pre-imprint temperature, pre-imprint pressure, imprint temperature, imprint pressure, imprint time, venting temperature and venting time, were varied in a certain range during the imprinting process. The imprinting results were analyzed with a three-level design of experiments (DOE) analysis. It was found that the pre-imprint pressure and imprint temperature are the key parameters. In addition, the DOE analysis is a powerful tool for NIL process optimization.

As a practice, a vacuum assisted and selective coating (VASC) method based on a commerical nanoimprinting tool was developed to fabricate micro-hole arrays on a PbSe nanocrystal film to study its spectral response to IR radiation for applications such as IR detection and photovoltaic. The process optimization significantly improves imprinting quality.

Copyright © 2012 by ASME

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