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Microfluidic Channel Fabrication With Tailored Wall Roughness

[+] Author Affiliations
Jing Ren, Sriram Sundararajan

Iowa State University, Ames, IA

Paper No. MSEC2012-7328, pp. 527-532; 6 pages
doi:10.1115/MSEC2012-7328
From:
  • ASME 2012 International Manufacturing Science and Engineering Conference collocated with the 40th North American Manufacturing Research Conference and in participation with the International Conference on Tribology Materials and Processing
  • ASME 2012 International Manufacturing Science and Engineering Conference
  • Notre Dame, Indiana, USA, June 4–8, 2012
  • Conference Sponsors: Manufacturing Engineering Division
  • ISBN: 978-0-7918-5499-0
  • Copyright © 2012 by ASME

abstract

Realistic random roughness of channel surfaces is known to affect the fluid flow behavior in microscale fluidic devices. This has relevance particularly for applications involving non-Newtonian fluids, such as biomedical lab-on-chip devices. In this study, a surface texturing process was developed and integrated into microfluidic channel fabrication. The process combines colloidal masking and Reactive Ion Etching (RIE) for generating random surfaces with desired roughness parameters on the micro/nanoscale. The surface texturing process was shown to be able to tailor the random surface roughness on quartz. A Large range of particle coverage (around 6% to 67%) was achieved using dip coating and drop casting methods using a polystyrene colloidal solution. A relation between the amplitude roughness, autocorrelation length, etch depth and particle coverage of the processed surface was built. Experimental results agreed reasonably well with model predictions. The processed substrate was further incorporated into microchannel fabrication. Final device with designed wall roughness was tested and proved a satisfying sealing performance.

Copyright © 2012 by ASME

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