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Experimental Measurement of Nano-Particle Emissions From Atomic Layer Deposition

[+] Author Affiliations
Jingwan Huo, Xiu Lin, Chris Yuan

University of Wisconsin-Milwaukee, Milwaukee, WI

Paper No. MSEC2012-7320, pp. 1105-1113; 9 pages
  • ASME 2012 International Manufacturing Science and Engineering Conference collocated with the 40th North American Manufacturing Research Conference and in participation with the International Conference on Tribology Materials and Processing
  • ASME 2012 International Manufacturing Science and Engineering Conference
  • Notre Dame, Indiana, USA, June 4–8, 2012
  • Conference Sponsors: Manufacturing Engineering Division
  • ISBN: 978-0-7918-5499-0
  • Copyright © 2012 by ASME


Atomic layer deposition (ALD) is a key enabling nanotechnology for a broad array of applications due to its ability to grow conformal and pinhole-free thin films and control layer growth at atomic scale. Like many nanotechnologies, the potential amount of nano-particle emissions from ALD nano-manufacturing system is a significant concern for both occupational and public health exposure. Here we report our preliminary investigations of nano-particle emissions at end-of-the-pipe of ALD nano-manufacturing system. Scanning Mobility Particle Sizer (SMPS) spectrometer is used for the nano-particle measurement during the ALD process of Al2O3 high-k dielectric gate materials using Trimethyl Aluminum (TMA) and H2O binary reactions. Under various experimental conditions tested in our project, the results demonstrate that the aerosol nanoparticle emissions from ALD nano-manufacturing system are averaged with a mean diameter of 201.28 nm and 940,850 particle concentrations at 200 °C reaction temperature.

Copyright © 2012 by ASME



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