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Mechanical Property and Processing Investigation of Pulsed Laser Deposited Al2O3 and AlN-TiN Thin Films

[+] Author Affiliations
Xinyu Wang, Cindy Waters, Sergey Yarmolenko, Dhananjay Kumar, Jagannathan Sankar

North Carolina A&T State University

Paper No. IMECE2004-61000, pp. 147-151; 5 pages
doi:10.1115/IMECE2004-61000
From:
  • ASME 2004 International Mechanical Engineering Congress and Exposition
  • Materials
  • Anaheim, California, USA, November 13 – 19, 2004
  • Conference Sponsors: Materials Division
  • ISBN: 0-7918-4712-8 | eISBN: 0-7918-4178-2, 0-7918-4179-0, 0-7918-4180-4
  • Copyright © 2004 by ASME

abstract

We have grown alumina (Al2 O3 ) and Aluminum Nitride - Titanium Nitride (AlN-TiN) multilayer thin films on (100) silicon substrates using KrF excimer pulsed laser. Hardness, Young’s Modulus and fracture toughness of the films were analyzed using Vickers and nanoindentation methods. The films with thicknesses ranging from 0.2 mm to 1.0 mm were tested under indentation loads as small as 100mN with the MTS nanoindentor up to 3000 mN with the Vickers test. By studying the Al2 O3 and AlN-TiN films on the Si substrates we were able to assess the fracture toughness and the nature of the cracking and delamination. The effects of the processing parameters (laser energy and substrate temperature) on these films were studied. The fracture toughness was analyzed by different methods.

Copyright © 2004 by ASME

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