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Engineering Monolayers With Strain Field

[+] Author Affiliations
Dongchoul Kim, Wei Lu

University of Michigan

Paper No. IMECE2004-59999, pp. 101-105; 5 pages
doi:10.1115/IMECE2004-59999
From:
  • ASME 2004 International Mechanical Engineering Congress and Exposition
  • Materials
  • Anaheim, California, USA, November 13 – 19, 2004
  • Conference Sponsors: Materials Division
  • ISBN: 0-7918-4712-8 | eISBN: 0-7918-4178-2, 0-7918-4179-0, 0-7918-4180-4
  • Copyright © 2004 by ASME

abstract

A binary monolayer on an elastic substrate may self-organize into ordered nanoscale patterns. Here we report a work of using a substrate strain field to guide the self-assembly process. The study shows that straining a substrate uniformly does not influence the pattern. However, a non-uniform strain field significantly influences the size, shape and distribution of self-assembled features. The study suggests a method of strain field design to make various monolayer patterns.

Copyright © 2004 by ASME

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