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Nanoindentation of a Deformable Substrate Covered by Patterned Nanodot Asperities

[+] Author Affiliations
Hengyu Wang, Min Zou

University of Arkansas, Fayetteville, AR

Robert L. Jackson

Auburn University, Auburn, AL

Preston R. Larson, Matthew B. Johnson

University of Oklahoma, Norman, OK

Paper No. IJTC2009-15043, pp. 285-287; 3 pages
doi:10.1115/IJTC2009-15043
From:
  • ASME/STLE 2009 International Joint Tribology Conference
  • ASME/STLE 2009 International Joint Tribology Conference
  • Memphis, Tennessee, USA, October 19–21, 2009
  • Conference Sponsors: Tribology Division
  • ISBN: 978-0-7918-4895-1 | eISBN: 978-0-7918-3862-4
  • Copyright © 2009 by ASME

abstract

This paper presents numerical and experimental studies of nanoindentation of a silicon substrate covered by patterned Ni nanodot asperities. A multi-asperity contact model was developed in this study to simulate the contact between a spherical indenter and the Ni nanodot asperities. In this model, the silicon substrate is considered to be deformable and the nanodots are allowed to interact with each other through the deformation of the substrate. The load-deformation relationship predicted by the model was found to be in good agreement with the experimental results. This model can also be used to predict indentation load-deformation relationships of a deformable substrate covered by nanodots with known size and location distributions, but not necessarily following a repetitive pattern.

Copyright © 2009 by ASME
Topics: Nanoindentation

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