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Effect of Sputtering Gas Pressure and Bias Voltage on Mechanical Properties of TiN Coating Deposited by DC Magnetron Sputtering

[+] Author Affiliations
Hirotaka Tanabe, Yoshio Miyoshi, Tohru Takamatsu

University of Shiga Prefecture, Hikone, Shiga, Japan

Hitoshi Awano

Chuo Spring Company, Ltd., Miyoshi, Aichi, Japan

Takaaki Yamano

Kansai University, Suita, Osaka, Japan

Paper No. PVP2004-2826, pp. 129-135; 7 pages
doi:10.1115/PVP2004-2826
From:
  • ASME/JSME 2004 Pressure Vessels and Piping Conference
  • Recent Advances in Nondestructive Evaluation Techniques for Material Science and Industries
  • San Diego, California, USA, July 25–29, 2004
  • Conference Sponsors: Pressure Vessels and Piping Division
  • ISBN: 0-7918-4679-2
  • Copyright © 2004 by ASME

abstract

The mechanical properties of TiN films deposited on carbon steel JIS S45C by reactive dc magnetron sputtering under three sputtering gas pressures, 0.5Pa, 0.8Pa, and 1.76Pa were investigated. The residual stress once increased and then decreased with increasing bias voltage at 0.5Pa and 0.8Pa, but increased monotonously at 1.76Pa. These variations could be explained by the variations of the bombarding energy of a sputtered ion at each gas pressure. The variations of hardness and toughness correlated with the variation of residual stress. The variation of adhesive strength also could be explained by the variation of the bombarding energy with a model proposed in this study. A specific wear rate was also investigated, and it was found that to increase not only the hardness but also the adhesive strength is necessary to improve the wear resistance of TiN films.

Copyright © 2004 by ASME

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