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Enabling Soft Lithography Using an Atomic Force Microscope

[+] Author Affiliations
Matthew S. Johannes, Robert L. Clark

Duke University, Durham, NC

Daniel G. Cole

University of Pittsburgh, Pittsburgh, PA

Paper No. DETC2008-49877, pp. 749-757; 9 pages
doi:10.1115/DETC2008-49877
From:
  • ASME 2008 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference
  • Volume 4: 20th International Conference on Design Theory and Methodology; Second International Conference on Micro- and Nanosystems
  • Brooklyn, New York, USA, August 3–6, 2008
  • Conference Sponsors: Design Engineering Division and Computers in Engineering Division
  • ISBN: 978-0-7918-4328-4 | eISBN: 0-7918-3831-5
  • Copyright © 2008 by ASME

abstract

Atomic force microscope (AFM) based anodization nanolithography generates nanoscale oxide patterns on a silicon substrate in a serial fashion. The design of a custom AFM system allows for the controlled deposition of oxide patterns in the 100 nm regime. Anisotropic etching of the substrates results in raised micro- and nanostructures. The resulting master patterns are shown to be useful for the molding of stamps for soft lithographic patterning at the nanoscale. The simplicity of this method enables prototypical investigation of new materials and processes for soft lithographic research.

Copyright © 2008 by ASME

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