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Heat and Mass Transfer in a CVD Optical Fiber Coating Process

[+] Author Affiliations
Wei Huang, Wilson K. S. Chiu

University of Connecticut, Storrs, CT

Paper No. HT-FED2004-56320, pp. 935-938; 4 pages
doi:10.1115/HT-FED2004-56320
From:
  • ASME 2004 Heat Transfer/Fluids Engineering Summer Conference
  • Volume 3
  • Charlotte, North Carolina, USA, July 11–15, 2004
  • Conference Sponsors: Heat Transfer Division and Fluids Engineering Division
  • ISBN: 0-7918-4692-X | eISBN: 0-7918-3740-8
  • Copyright © 2004 by ASME

abstract

In this paper, we study the chemical vapor deposition (CVD) process used to hermetically coat optical fibers during draw. Temperature is calculated by coupling radiation and convection heat transfer by the reactor walls and gas flow with a radially-lumped heat transfer model for the moving optical fiber. Multi-component species diffusion is modeled using the Maxwell-Stefan equations. Gas-phase reaction kinetics is modeled using a 2-step chemical kinetics mechanism derived from RRKM theory with detailed kinetics data compiled from literature. Surface reaction kinetics are described using collision theory in which a sticking coefficient is used as an empirical parameter to predict surface reactions. A parameter study is carried out with various optical fiber inlet temperature and drawing speed, and validated with experiment results.

Copyright © 2004 by ASME

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