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Design of a High-Bandwidth XY Nanopositioning Stage for High-Throughput Micro/Nano Manufacturing

[+] Author Affiliations
Sebastian Polit, Jingyan Dong

North Carolina State University, Raleigh, NC

Paper No. IMECE2010-37794, pp. 709-718; 10 pages
doi:10.1115/IMECE2010-37794
From:
  • ASME 2010 International Mechanical Engineering Congress and Exposition
  • Volume 3: Design and Manufacturing, Parts A and B
  • Vancouver, British Columbia, Canada, November 12–18, 2010
  • Conference Sponsors: ASME
  • ISBN: 978-0-7918-4427-4
  • Copyright © 2010 by ASME

abstract

A high natural frequency (open-loop bandwidth) is a critical requirement for nanopositioners in high-throughput nanomanufacturing and nano-metrology applications. This paper presents the design and analysis of a high-bandwidth nanopositioning XY stage. The monolithic stage design has two axes and each axis is comprised of a doubly-clamped beam and a parallelogram hybrid flexure with complaint beams and circular flexure hinges. The doubly-clamped beam that is actuated by a piezoelectric actuator acts as a linear prismatic axis. The parallelogram hybrid flexures are used to decouple the actuation effect from the other axis. The mechanism design decouples the motion in the X and Y directions and restricts parasitic rotations in the XY plane while allowing for an increased bandwidth with linear kinematics in the operating region (or workspace). Kinematic and dynamic analysis shows that the mechanical structure of the stage has decoupled motion in XY direction, while achieving high bandwidth and good linearity. Finite element analysis is adapted to verify the dynamic responses from theoretical analysis. The stage is actuated by piezoelectric stack actuators, and two capacitive gauges were added to the system to build a closed-loop positioning system. The results from frequency test show that the resonation frequencies of the two vibrational modes are over 8K Hz. The stage is capable of about 15 microns of motion along each axis with a resolution of about 1 nanometer. Due to parallel kinematic mechanism design, a uniform performance is achieved across the workspace. A PI controller is implemented for the stage and a high closed-loop bandwidth is obtained.

Copyright © 2010 by ASME
Topics: Manufacturing , Design

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