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Shadow Edge Lithography and Application to Nanofluidics

[+] Author Affiliations
Woon-Hong Yeo, Jae-Hyun Chung

University of Washington, Seattle, WA

Dong Won Lee

Interlake High School, Bellevue, WA

Kyong-Hoon Lee

NanoFacture, Inc., Bellevue, WA

Paper No. NEMB2010-13307, pp. 63-64; 2 pages
doi:10.1115/NEMB2010-13307
From:
  • ASME 2010 First Global Congress on NanoEngineering for Medicine and Biology
  • ASME 2010 First Global Congress on NanoEngineering for Medicine and Biology
  • Houston, Texas, USA, February 7–10, 2010
  • Conference Sponsors: ASME Nanotechnology Council
  • ISBN: 978-0-7918-4392-5 | eISBN: 978-0-7918-3866-2
  • Copyright © 2010 by ASME

abstract

Many upcoming applications, such as nanoelectronic circuitry, single-molecule based chips, nanofluidics, chemical sensors, and fuel cells, require large arrays of nanochannels and nanowires. To commercialize such nanostructured devices, a high resolution and high throughput patterning method is essential. For this purpose, we developed the shadow edge lithography (SEL) as a wafer-scale, high-throughput nanomanufacturing method [1]. In the proposed method, the shadow effect in the high-vacuum evaporation was theoretically analyzed to predict the geometric distribution of the nanoscale patterns [2]. In experiment, nanoscale patterns were created by the shadow of aluminum (Al) edges that were prepatterned using a conventional microfabrication method.

Copyright © 2010 by ASME

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