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Thermal-CVD System Designed for Growth of Carbon Nanotubes

[+] Author Affiliations
Samuele Porro, Simone Musso, Massimo Rovere, Mauro Giorcelli, Angelica Chiodoni, Alberto Tagliaferro

Politecnico di Torino, Torino, Italy

Paper No. ESDA2006-95721, pp. 1025-1034; 10 pages
doi:10.1115/ESDA2006-95721
From:
  • ASME 8th Biennial Conference on Engineering Systems Design and Analysis
  • Volume 2: Automotive Systems, Bioengineering and Biomedical Technology, Fluids Engineering, Maintenance Engineering and Non-Destructive Evaluation, and Nanotechnology
  • Torino, Italy, July 4–7, 2006
  • ISBN: 0-7918-4249-5 | eISBN: 0-7918-3779-3
  • Copyright © 2006 by ASME

abstract

We report a study on a thermal chemical vapor deposition (CVD) system optimized for the growth of well packed and vertically aligned carbon nanotubes (CNTs) on uncoated silicon substrates. The process of synthesis involves the co-evaporation of a carbon precursor and a metal catalyst in a nitrogen atmosphere inside a high temperature furnace. Beside the formation of CNTs, depending in particular on the deposition temperature, other carbon structures can be deposited, such as nanographite. We show the growth results analyzed by different characterization techniques (electron microscopy, porosity and thermal stability investigations, micro-Raman spectroscopy). In addition, we report an investigation on the development of secondary transversal vortex flows caused by the effects of distribution of temperatures inside the growth system, in order to correlate them with the growth results.

Copyright © 2006 by ASME

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