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EHD Conduction Pump Designed for Flow Control of Parallel Evaporators

[+] Author Affiliations
Yinshang Feng, Jamal Seyed-Yagoobi, Subhra Datta

Illinois Institute of Technology, Chicago, IL

Paper No. IMECE2003-41149, pp. 15-19; 5 pages
  • ASME 2003 International Mechanical Engineering Congress and Exposition
  • Heat Transfer, Volume 4
  • Washington, DC, USA, November 15–21, 2003
  • Conference Sponsors: Heat Transfer Division
  • ISBN: 0-7918-3718-1 | eISBN: 0-7918-4663-6, 0-7918-4664-4, 0-7918-4665-2
  • Copyright © 2003 by ASME


Non-uniform pressure drops and the uneven heat load can easily cause the mal-distribution of the working fluids in the parallel evaporator lines, which further leads to non-optimum thermal performance. The electrically driven flow based on the electrohydrodynamic (EHD) conduction pumping has potential to actively control the two-phase flow distribution among parallel evaporator lines. In this paper, an EHD conduction pump, designed for active flow control of the parallel evaporators, is experimentally investigated in a single-phase liquid refrigerant loop. specifically, the pressure head, the net flow velocity, and the power consumption at different applied potentials are presented. HCFC refrigerant R-123 is used as the working fluid. In the absence of a net flow, the EHD conduction pump with three electrode pairs generated 1270 Pa at 17 kV with HCFC refrigerant R-123 as the working fluid. In the presence of a net flow, the EHD conduction pump generated a pressure head of 425Pa and a velocity of 8.9cm/s at 15kV. The corresponding power consumption was below 1W. The generated pressure head and the corresponding liquid flow can effectively control the flow distribution among parallel evaporator lines.

Copyright © 2003 by ASME



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