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The UTAM Nano-Patterning: A New Surface Nano-Patterning Technique in Fabricating Ordered Arrayed Surface Nanostructures

[+] Author Affiliations
Yong Lei, Gerhard Wilde

University of Muenster, Muenster, Germany

Paper No. MNC2007-21628, pp. 1557-1560; 4 pages
doi:10.1115/MNC2007-21628
From:
  • 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems
  • First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B
  • Sanya, Hainan, China, January 10–13, 2007
  • Conference Sponsors: Nanotechnology Institute
  • ISBN: 0-7918-4265-7 | eISBN: 0-7918-3794-7
  • Copyright © 2007 by ASME

abstract

A new surface nano-patterning technique, the so-called UTAM nano-patterning approach, is reported here in this paper. Using the UTAM nano-patterning technique, large-scale arrays of highly ordered nanostructures (nanoparticles and nanoholes) in the range of square centimeters have been fabricated on substrates in a massive parallel way. The resulting nanostructures are characterized by highly defined and controllable size, shape, composition, and spacing of the nanostructures. By changing the structural parameters of the nanoparticles, the properties of the nanoparticle arrays can be tuned. This non-lithographic surface nano-patterning approach provides an efficient and low-cost alternative in fabricating large-scale ordered arrays of surface nanostructures.

Copyright © 2007 by ASME

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