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Guided Self-Assembly via Designed Strain Field

[+] Author Affiliations
Wei Lu

University of Michigan, Ann Arbor, MI

Paper No. MNC2007-21614, pp. 729-733; 5 pages
doi:10.1115/MNC2007-21614
From:
  • 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems
  • First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B
  • Sanya, Hainan, China, January 10–13, 2007
  • Conference Sponsors: Nanotechnology Institute
  • ISBN: 0-7918-4265-7 | eISBN: 0-7918-3794-7
  • Copyright © 2007 by ASME

abstract

We apply an elastic field to the substrate to guide the self-assembly of domain patterns on its surface. The effect of arbitrary three dimensional external loading is found to be characterized by a single two dimensional parameter—a surface stain field of the substrate. A non-uniform strain field significantly influences the size, shape and orientation of self-assembled features, and may induce the formation of pattern colonies. It is shown that a pattern orientates normal to the strain gradient direction. An applied load anchors the position of a self-assembled pattern relative to the substrate, where a colony boundary resides on the strain gradient region. The work suggests a method of strain field design to make various monolayer patterns for nanofabrication.

Copyright © 2007 by ASME
Topics: Self-assembly

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