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Optimization in Design of High-g Accelerometers

[+] Author Affiliations
Jun Liu

North University of China, Taiyuan, Shanxi, China; University of California at Berkeley, Berkeley, CA

Xiaojin Qi, Yunbo Shi

North University of China, Taiyuan, Shanxi, China

Fai Ma

University of California at Berkeley, Berkeley, CA

Paper No. MNC2007-21277, pp. 469-474; 6 pages
doi:10.1115/MNC2007-21277
From:
  • 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems
  • First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B
  • Sanya, Hainan, China, January 10–13, 2007
  • Conference Sponsors: Nanotechnology Institute
  • ISBN: 0-7918-4265-7 | eISBN: 0-7918-3794-7
  • Copyright © 2007 by ASME

abstract

Under the operating conditions of high collision and strong vibration, a new high-g piezoresistive accelerometer (with a full range of 150000g) is designed. This design consists of 4-beams and 1-tower. This structure possesses superior anti-shock ability. In optimizing this piezoresistive bridge structure, a tower is etched directly from the back of the mass in KOH by using the (111) plane etch-stop technique. Since the distances between the mass center of the tower and the mass centers of the beams are shortened, anti-shock ability in transverse directions is improved. In addition, the fabrication process is relatively straightforward. Finally, it is found by impact experiments that the linearity of the optimized design lies within 9% for measurements in the range of 0–150000g.

Copyright © 2007 by ASME

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