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Fabrication of Nanoscale Linewidth Standards Based on Multilayer Thin Film Deposition Technique

[+] Author Affiliations
Fengxia Zhao

Xi’an Jiaotong University, Xi’an, China; Zhengzhou University, Zhengzhou, China

Weixuan Jing

Xi’an Jiaotong University, Xi’an, China; Tianjin University, Tianjin, China

Zhuangde Jiang, Haoliang Duan

Xi’an Jiaotong University, Xi’an, China

Paper No. MNC2007-21105, pp. 335-339; 5 pages
doi:10.1115/MNC2007-21105
From:
  • 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems
  • First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B
  • Sanya, Hainan, China, January 10–13, 2007
  • Conference Sponsors: Nanotechnology Institute
  • ISBN: 0-7918-4265-7 | eISBN: 0-7918-3794-7
  • Copyright © 2007 by ASME

abstract

To overcome the difficulties in the fabrication of nanoscale linewidth standards with lithography, a method of fabricating nanoscale multiple linewidth standards based on multilayer thin film deposition technique is presented in this paper. This method can be implemented easily and does not require the use of complex and expensive techniques, and it has advantage of well-controlled linewidth over various millimetres (using thin film thickness control) and versatile materials selection of the grating lines. Nanoscale multiple linewidth samples with nominal linewidths of 20 nm, 25 nm, 35 nm have been fabricated with the presented method. The lines of the fabricated samples have uniform attributes and good linearity over hundreds microns.

Copyright © 2007 by ASME

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