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A Si3N4 Tube Formed Using TMAH Etching

[+] Author Affiliations
Huijun Chen, Dacheng Zhang

Peking University, Beijing, China

Paper No. MNC2007-21245, pp. 65-70; 6 pages
doi:10.1115/MNC2007-21245
From:
  • 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems
  • First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B
  • Sanya, Hainan, China, January 10–13, 2007
  • Conference Sponsors: Nanotechnology Institute
  • ISBN: 0-7918-4265-7 | eISBN: 0-7918-3794-7
  • Copyright © 2007 by ASME

abstract

In this paper, micro-tube fabricated from SiO2 /Si3 N4 strained composite structures using a self-scrolling procedure is presented. This fabrication is a self-organization process using stress of bifilm. This technique is based on self-rolling of a thin highly strained SiO2 / Si3 N4 bifilm detached from the substrate by TMAH selective etching. The material of bifilm and the solution for anisotropic etching are in common use, so this method can be widely used in the future.

Copyright © 2007 by ASME

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