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The Effects of Process Parameters on Carbon Nanotube Synthesis by Plasma Enhanced Chemical Vapor Deposition (PECVD)

[+] Author Affiliations
Sungwon S. Kim, Timothy S. Fisher

Purdue University

Paper No. IMECE2005-81431, pp. 575-580; 6 pages
doi:10.1115/IMECE2005-81431
From:
  • ASME 2005 International Mechanical Engineering Congress and Exposition
  • Electronic and Photonic Packaging, Electrical Systems Design and Photonics, and Nanotechnology
  • Orlando, Florida, USA, November 5 – 11, 2005
  • Conference Sponsors: Electronic and Photonic Packaging Division
  • ISBN: 0-7918-4217-7 | eISBN: 0-7918-3769-6
  • Copyright © 2005 by ASME

abstract

Plasma-enhanced chemical vapor deposition (PECVD) offers a variety of advantages in the synthesis of carbon nanotubes in that several critical synthesis parameters can be controlled independently. In the present study, the effects of reacting gas composition, catalyst film thickness and bias voltage are investigated. Carbon nanotube samples are grown in a microwave PECVD chamber on clean silicon substrates. Gas composition is varied from carbon-rich to carbon-lean by controlling the methane flow rate. The results indicate that gas-phase composition profoundly affects the synthesized material, which is shown to be randomly oriented nanotube mats for moderate-to-rich gas mixtures and non-tubular carbon for very lean mixtures. The non-tubular content is shown to contain disordered and graphitic bonding by Raman spectrometry. Vertically aligned nanostructures are obtained under the presence of bias voltage.

Copyright © 2005 by ASME

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