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Surface-Plasmons-Assisted Nanoscale Photolithography

[+] Author Affiliations
Dongbing Shao, Shaochen Chen

University of Texas at Austin, Austin, TX

Paper No. NANO2005-87058, pp. 71-72; 2 pages
  • ASME 4th Integrated Nanosystems Conference
  • Design, Synthesis, and Applications
  • Berkeley, California, USA, September 12–14, 2005
  • Conference Sponsors: Nanotechnology Institute
  • ISBN: 0-7918-4208-8 | eISBN: 0-7918-3771-8
  • Copyright © 2005 by ASME


Photolithography has remained a useful micro-fabrication technology because of its high throughput, low cost, simplicity, and reproducibility over the past several decades. However its resolution is limited at a sub-wavelength scale due to optical diffraction. Among all different approaches to overcoming this problem, such as electron-beam lithography, imprint lithography and scanning probe lithography, near-field optical lithography inherits many merits of the traditional photolithography method. Major drawbacks of this approach include low contrast, low transmission and low density.

Copyright © 2005 by ASME



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