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Issues in Vapor Phase Lubrication of Magnetic Data Storage Media

[+] Author Affiliations
Andrew J. Gellman, Yang Yun

Carnegie Mellon University, Pittsburgh, PA

Paper No. WTC2005-63165, pp. 681-682; 2 pages
doi:10.1115/WTC2005-63165
From:
  • World Tribology Congress III
  • World Tribology Congress III, Volume 1
  • Washington, D.C., USA, September 12–16, 2005
  • Conference Sponsors: Tribology Division
  • ISBN: 0-7918-4201-0 | eISBN: 0-7918-3767-X
  • Copyright © 2005 by ASME

abstract

Vapor phase lubrication (VPL) integrates media lubrication with the vacuum processing steps used throughout most of the hard disk media fabrication process. This avoids exposure of the unlubricated a-CHx overcoat surface to the ambient air and airborne contamination. In vapor lubrication the a-CHx surface can be oxidized under controlled conditions immediately prior to lubricant adsorption. The kinetics of a-CHx oxidation have been studied using x-ray photoemission spectroscopy in an apparatus that allows oxidation of freshly deposited a-CHx films. The dissociative sticking coefficient of oxygen is ∼10−6 and the initial oxidation kinetics can be described by a Langmuir-Hinshelwood mechanism.

Copyright © 2005 by ASME

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