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Development of a New Microscopic Four-Point AFM Probe for the Measurement of Local Electrical Conductivity

[+] Author Affiliations
Bing-Feng Ju, Yang Ju, Masumi Saka

Tohoku University, Sendai, Japan

Paper No. IPACK2005-73433, pp. 1955-1958; 4 pages
doi:10.1115/IPACK2005-73433
From:
  • ASME 2005 Pacific Rim Technical Conference and Exhibition on Integration and Packaging of MEMS, NEMS, and Electronic Systems collocated with the ASME 2005 Heat Transfer Summer Conference
  • Advances in Electronic Packaging, Parts A, B, and C
  • San Francisco, California, USA, July 17–22, 2005
  • Conference Sponsors: Heat Transfer Division and Electronic and Photonic Packaging Division
  • ISBN: 0-7918-4200-2 | eISBN: 0-7918-3762-9
  • Copyright © 2005 by ASME

abstract

A microscopic four-point atomic force microscope (AFM) probe with concomitant experimental technique for local conductivity measurement is presented. A silicon nitride based AFM contact-mode probe with a V-shaped tip, which patterned by using the conventional photolithography method, is selected. The probe is then etched to four parallel isolated electrodes for the purpose of performing current input and electrical potential drop measurement. The new probe not only inherits the function of surface topography generating but also has the capability of characterizing the local conductivity simultaneously. The nanoresolution position control mechanism of AFM allows the probe scanning across micrometers sized area and creating high spatial resolution map of the in-plane conductivities. Experiments have shown the microscopic four-point probe to be mechanically flexible and robust. The repeatable conductivity measurements on the surface of aluminum and indium tin oxide (ITO) thin films indicate the technique has potential application for characterizing the devices and materials in microscale.

Copyright © 2005 by ASME

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