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Exploration of Thermolithography for Micro- and Nano-Manufacturing

[+] Author Affiliations
Ming-Tsung Hung, Y. Sungtaek Ju

University of California at Los Angeles, Los Angeles, CA

Paper No. IPACK2005-73424, pp. 1949-1954; 6 pages
doi:10.1115/IPACK2005-73424
From:
  • ASME 2005 Pacific Rim Technical Conference and Exhibition on Integration and Packaging of MEMS, NEMS, and Electronic Systems collocated with the ASME 2005 Heat Transfer Summer Conference
  • Advances in Electronic Packaging, Parts A, B, and C
  • San Francisco, California, USA, July 17–22, 2005
  • Conference Sponsors: Heat Transfer Division and Electronic and Photonic Packaging Division
  • ISBN: 0-7918-4200-2 | eISBN: 0-7918-3762-9
  • Copyright © 2005 by ASME

abstract

Lithography is a critical enabling technology for manufacturing micro- and nano-scale devices and structures. The manuscript presents our recent progress in the exploration of a new lithography technique that employs localized heating to induce thermo-chemical crosslinking of photoresist layers. The thermal transport properties of photoresist layers are measured and kinetics of cross-linking reactions is studied using microfabricated heaters as localized heat sources. It is demonstrated that polymer films can be patterned in a controlled manner using heater temperature, heating duration, as well as UV exposure dose as control variables. The data and experimental approaches presented here will help systematic evaluation and development of thermolithography schemes.

Copyright © 2005 by ASME
Topics: Manufacturing

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