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Selective Surface Modification and Patterning on Self-Assembled Monolayers by a Micro-Plasma Discharge

[+] Author Affiliations
Jinan Chai, Baoming Li, Daniel Y. Kwok

University of Alberta, Edmonton, AB, Canada

Paper No. ICMM2005-75172, pp. 613-616; 4 pages
doi:10.1115/ICMM2005-75172
From:
  • ASME 3rd International Conference on Microchannels and Minichannels
  • ASME 3rd International Conference on Microchannels and Minichannels, Part B cont’d
  • Toronto, Ontario, Canada, June 13–15, 2005
  • Conference Sponsors: Nanotechnology Institute
  • ISBN: 0-7918-4185-5 | eISBN: 0-7918-3758-0
  • Copyright © 2005 by ASME

abstract

In this paper, we will demonstrate a selective surface patterning method by a micro-plasma discharge. In this method, argon plasma is ignited through a hole of copper clad polyimide microstructure electrodes. As an illustration, experiments were performed in which an octadecanethiol (CH3 (CH2 )17 SH) self-assembled monolayer (SAM) on a gold film is exposed to a microdischarge and subsequently followed by immersion into the 16-mercaptohexadecanoic acid (COOH(CH2 )15 SH) solution. The octadecanethiol SAM is desorbed upon Ar plasma exposure, allowing the formation of a second SAM on the damaged region [Chai et al, App. Phys. Lett., 86, 034107 (2005)]. The patterned samples are viewed by using optical microscope and scanning electron microscopy. The advantage of this approach is that it is noncontact and eliminates the need of photolithography. The patterned samples can be employed to microfluidic self-propelled movement.

Copyright © 2005 by ASME

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