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Gaseous Slip Flow in a Micro-Channel

[+] Author Affiliations
Shou-Shing Hsieh, Huang-Hsiu Tsai, Chih-Yi Lin, Ching-Fang Huang, Cheng-Ming Chien

National Sun Yat-Sen University, Kaohsiung, Taiwan, R.O.C.

Paper No. ICMM2003-1033, pp. 299-306; 8 pages
doi:10.1115/ICMM2003-1033
From:
  • ASME 2003 1st International Conference on Microchannels and Minichannels
  • 1st International Conference on Microchannels and Minichannels
  • Rochester, New York, USA, April 24–25, 2003
  • Conference Sponsors: Nanotechnology Institute
  • ISBN: 0-7918-3667-3
  • Copyright © 2003 by ASME

abstract

An experimental and theoretical study of low Reynolds number compressible gas flow in a micro channel is presented. Nitrogen gas was used. The channel was microfabricated on silicon wafers and were 50 μm deep, 200 μm wide and 24000 μm long. The Knudsen number ranged from 0.001 to 0.02. Pressure drop were measured at different mass flow rates in terms of Re and found in good agreement with those predicted by analytical solutions in which a 2-D continuous flow model with first slip boundary conditions are employed and solved by perturbation methods.

Copyright © 2003 by ASME

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